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ALD (Atomic Layer Deposition) for Glove Box


ALD (Atomic Layer Deposition) for Glove Box
ALD (Atomic Layer Deposition) for Glove Box

Atomic Layess for depositing thin atomic layers;

ALD is a particular form of CVD (Chemical Vapour Deposition). The main difference between ALD and generic CVD is the sequential, and not simultaneous, introduction of the precursors into the reaction chamber;

Although slower than other techniques, the process provides a better structural quality;

Allows deposition of TiO2, Al2O3, SiO2, ZnO, MgO, NiO, SnO2, Nb2O5 layer by layer.r Deposition (ALD) is a proce

Applications
  • Energy
  • Laboratories and R&D
  • Pharmaceutical & Medical
  • Heavy Industry
  • Nuclear

For technical data and more information; please click here !

T.G. 805

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